TITLE

Precision IC-lithography measurement scheme trims errors to less than 10 nm

AUTHOR(S)
Bursky, Dave
PUB. DATE
September 1994
SOURCE
Electronic Design;9/5/94, Vol. 42 Issue 18, p32
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Investigates the importance of lithographic tool to create deep sub-micron feature sizes. Ongoing development by Nikon Precision Incorporated, Belmont, California; Structural and functional analysis; Pattern co-ordinate measurement; 64- and 256-Mbit DRAMs and XY-5i.
ACCESSION #
9501032544

 

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