TITLE

Optical properties of a light-emitting polymer directly patterned by soft lithography

AUTHOR(S)
Lawrence, J. R.; Andrew, P.; Barnes, W. L.; Buck, M.; Turnbull, G. A.; Samuel, I. D. W.
PUB. DATE
September 2002
SOURCE
Applied Physics Letters;9/9/2002, Vol. 81 Issue 11, p1955
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We present the optical properties of a directly patterned light-emitting polymer. The patterned poly(2-methoxy-5-(3',7'-dimethyloctyloxy)-paraphenylenevinylene film is fabricated using hot embossing lithography. The effect of the embossed microstructure on the light emitted from the polymer is examined by measuring the angle-dependent photoluminescence and its photonic band structure. The imposed grating modifies the emitted light by Bragg scattering into free space light that would otherwise be trapped as waveguide modes. This simple patterning technique may find application in improving the performance of light-emitting polymer devices.
ACCESSION #
7281447

 

Related Articles

  • Bottom-up soft-lithographic fabrication of three-dimensional multilayer polymer integrated optical microdevices. Huang, Yanyi; Paloczi, George T.; Poon, Joyce K. S.; Yariv, Amnon // Applied Physics Letters;10/11/2004, Vol. 85 Issue 15, p3005 

    We develop a method to efficiently fabricate three-dimensional multilayer polymer microchips for integrated optical applications. This method uses soft lithography to mold the core structures on top of the cladding layers. By repeating the process, a three-dimensional multilayer integrated...

  • Alignment of liquid crystals by topographically patterned polymer films prepared by nanoimprint lithography. Yi, Youngwoo; Nakata, Michi; Martin, Alexander R.; Clark, Noel A. // Applied Physics Letters;4/16/2007, Vol. 90 Issue 16, p163510 

    Nanoimprint lithographically (NIL) prepared polymer film replicas of micrometer scale topographic master patterns are used as liquid crystal alignment surfaces. Depolarized transmission light microscopy study of nematic liquid crystal cells made using the replicas as one window shows that the...

  • Comparison between dynamic plowing lithography and nanoindentation methods. Cappella, B.; Sturm, H. // Journal of Applied Physics;1/1/2002, Vol. 91 Issue 1, p506 

    Two different methods of nanolithography, namely dynamic plowing lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methylmethacrylate) and polystyrene. No fundamental differences can be found out...

  • Mach-Zehnder modulator is molded from polymer.  // Laser Focus World;Nov2004, Vol. 40 Issue 11, p9 

    The article reports on recent development in research field of electro-optic polymers. Electro-optic polymers are being explored for use in integrated optical circuits. Their low material dispersion allows electro-optic modulation bandwidths up to 1.6 THz. Using soft-stamp replica-molding...

  • Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography. Shir, D.; Nelson, E. C.; Chen, Y. C.; Brzezinski, A.; Liao, H.; Braun, P. V.; Wiltzius, P.; Bogart, K. H. A.; Rogers, J. A. // Applied Physics Letters;1/5/2009, Vol. 94 Issue 1, p011101 

    We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying...

  • Multi-wavelength lasing in a beat structure. Tianrui Zhai; Xiaofeng Wu; Fei Tong; Songtao Li; Meng Wang; Xinping Zhang // Applied Physics Letters;12/26/2016, Vol. 109 Issue 26, p261906-1 

    Multi-wavelength polymer lasers are produced with one-dimensional beat structures fabricated with multiple gratings at the same substrate location using interference lithography. As a distributed feedback cavity, the beat structure is equivalent to a linear superposition of multiple grating...

  • Long period polymer waveguide grating device with positive temperature sensitivity. Tang, H.Y.; Wong, W.H.; Pun, E.Y.B. // Applied Physics B: Lasers & Optics;Jul2004, Vol. 79 Issue 1, p95 

    A long-period waveguide grating (LPWG) was demonstrated in a low-loss negative tone UV-sensitive epoxy novolak resin polymer. The grating structure was fabricated on top of the waveguide using a standard UV lithography process, and no other subsequent process is required after the development...

  • Solving the 192nm optics contamination puzzle. Higley, John // Solid State Technology;Dec2002, Vol. 45 Issue 12, p92 

    Describes methods and procedures for controlling optics contamination. Lithography processes; Optics protection; Photoresists; Identification of contaminants and pollutants.

  • So many options, so little time: Why optics is forever in lithography. Ware, Phillip M. // Solid State Technology;May2000, Vol. 43 Issue 5, p192 

    Considers the use of optical extension techniques in lithography. Challenges of making extreme ultraviolet lithography feasible; Issue on how high projection lens numerical-aperture can go; Implication of optical lithography to the industry.

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics