TITLE

Comparison between dynamic plowing lithography and nanoindentation methods

AUTHOR(S)
Cappella, B.; Sturm, H.
PUB. DATE
January 2002
SOURCE
Journal of Applied Physics;1/1/2002, Vol. 91 Issue 1, p506
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Two different methods of nanolithography, namely dynamic plowing lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methylmethacrylate) and polystyrene. No fundamental differences can be found out in the efficiency of the two methods, i.e., in the depth of the lithographed structure as a function of the scanning parameters. The main drawback of FDI is that it is much more time consuming than DPL. On the other hand, when the sample is lithographed with DPL, the border walls that surround the lithographed structure are very much bigger than the border walls created through FDI. The physicochemical properties of the border walls created through DPL have been investigated. Several experimental data reveal that such border walls are very much softer and looser than unmodified polymers and suggest that during DPL the fast oscillating tip is able to break polymer chains. This does not happen with FDI, where border walls are simply made up of the material carved out by the tip. A method to eliminate these undesirable border walls is suggested. © 2002 American Institute of Physics.
ACCESSION #
5742179

 

Related Articles

  • Mapping the road to NIL. J. J. M. // Solid State Technology;Jun2006, Vol. 49 Issue 6, p28 

    The article reports on the concluded three-year study which identifies key parameters determining the outcome of the nanoimprint lithography (NIL) process in the U.S. The research showed parameter that determine the process outcome specifically the key geometry factors that could be used to...

  • Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists. Wang, Michael X.; Lin, Eric K.; Karim, Alamgir; Fasolka, Michael J. // AIP Conference Proceedings;2003, Vol. 683 Issue 1, p448 

    Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental material properties of the confined resist...

  • Polymer laser is nearly diffraction limited. Powell, Paula Noaker // Laser Focus World;Dec2000, Vol. 36 Issue 12, p48 

    Reports that a German research team has fabricated a mechanically flexible conjugated polymer laser with a two dimensional photonic band structure without relying on standard lithographic techniques. Substrate and polymer used as the laser's active layer; Universities and institutes of the...

  • Excimer laser etching of polymers. Srinivasan, V.; Smrtic, Mark A.; Babu, S. V. // Journal of Applied Physics;6/1/1986, Vol. 59 Issue 11, p3861 

    Examines the excimer laser etching of polymers. Factor attributed to the process of ablation; Mechanisms which contribute to the ablation of Kapton or polyimide; Discussion on excimer laser lithography.

  • Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography. Qiangfei Xia, David; Chris Keimel, David; Haixiong Ge, David; Zhaoning Yu; Wei Wu; Chou, Stephen Y. // Applied Physics Letters;11/24/2003, Vol. 83 Issue 21, p4417 

    We propose and demonstrate a nanopatterning technique, laser-assisted nanoimprint lithography (LAN), in which the polymer is melted by a single excimer laser pulse and then imprinted by a mold made of fused quartz. LAN has been used to pattern nanostructures in various polymer films on a Si or...

  • Optical properties of a light-emitting polymer directly patterned by soft lithography. Lawrence, J. R.; Andrew, P.; Barnes, W. L.; Buck, M.; Turnbull, G. A.; Samuel, I. D. W. // Applied Physics Letters;9/9/2002, Vol. 81 Issue 11, p1955 

    We present the optical properties of a directly patterned light-emitting polymer. The patterned poly(2-methoxy-5-(3',7'-dimethyloctyloxy)-paraphenylenevinylene film is fabricated using hot embossing lithography. The effect of the embossed microstructure on the light emitted from the polymer is...

  • Optical lithography: Azopolymer option. Won, Rachel // Nature Photonics;Nov2011, Vol. 5 Issue 11, p649 

    The article reports on the optical lithography research by the researchers at Aalto University in Finland, which uses azobenzene-containing polymers or azopolymers to fabricate large portions of silicon nanostructures.

  • Simulations with a dynamic reaction–diffusion model of the polymer grating preparation by patterned ultraviolet illumination. Leewis, Christian M.; de Jong, Arthur M.; van IJzendoorn, Leo J.; Broer, Dirk J. // Journal of Applied Physics;6/15/2004, Vol. 95 Issue 12, p8352 

    Simulations of volume fraction profiles formed during the lithographic preparation of polymer gratings are made with a reaction/diffusion model, based on the Flory–Huggins theory. Monomer migration is driven by a gradient in the chemical potential rather than a gradient in the...

  • Low-voltage electron beam lithography with a scanning tunneling microscope. Marrian, C. R. K.; Colton, R. J. // Applied Physics Letters;2/19/1990, Vol. 56 Issue 8, p755 

    Studies of a polydiacetylene negative electron beam resist have been made in a scanning tunneling microscope operated in vacuum at pressures in the 10-8 Torr range. The resist can be imaged if it is applied as a thin film to a conductive flat substrate and the tip bias voltage is chosen...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics