Soluble cyclopolymers based on 1,1,2,3,3-pentafluoro-4-(1,1,1,3,3,3-hexafluoro-2-hydroxy-2-propyl)-1,6-heptadiene: Synthesis and chemical transformations

Vainer, A. Ya.; Dyumaev, K. M.; Eremina, L. A.; Zelikson, K. I.; Pinchuk, E. M.; Shturman, M. N.
November 2010
Doklady Chemistry;Nov2010, Vol. 435 Issue 1, p275
Academic Journal
The article presents a study in which a method for the design and synthesis of polymers for nano-lithography technology is proposed. The polymers used are adequate to the technology with radiation exposure at 193 nanometer (nm) and are also suitable for electronic chips with 65 nm design rules. Thermal transformations in the matrices of thus synthesized polymers are also studied.


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