Hybrid template approach achieves sub-30 nm NIL

November 2008
Laser Focus World;Nov2008, Vol. 44 Issue 11, p17
The article describes a hybrid molecular-ruler approach developed at the Pennsylvania State University which achieves sub-30 nm patterning over a full water. It shows how electron-beam lithography or other methods create the first level of metallic features. A final etching process transfers the metallic pattern into the quartz substrate.


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