TITLE

Nanoimprint lithography: 2D or not 2D? A review

AUTHOR(S)
Schift, Helmut
PUB. DATE
November 2015
SOURCE
Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p415
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like substrates. It is essentially a 3D process, because it replicates various stamp topographies by 3D displacement of material and takes advantage of the bending of stamps while the mold cavities are filled. But at the same time, it keeps all assets of a 2D technique being able to pattern thin masking layers like in photon- and electron-based traditional lithography. This review reports about 20 years of development of replication techniques at Paul Scherrer Institut, with a focus on 3D aspects of molding, which enable NIL to stay 2D, but at the same time enable 3D applications which are 'more than Moore.' As an example, the manufacturing of a demonstrator for backlighting applications based on thermally activated selective topography equilibration will be presented. This technique allows generating almost arbitrary sloped, convex and concave profiles in the same polymer film with dimensions in micro- and nanometer scale.
ACCESSION #
110221612

 

Related Articles

  • Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds. Kwon, B.; Kim, Jong H. // Journal of Nanoscience;2016, Vol. 2016, p1 

    Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and...

  • SILICONE RUBBER MOULDS FOR FOOTWEAR. LUCA, Cornelia; MOCANU, Rãzvan // Fiability & Durability / Fiabilitate si Durabilitate;2013 Supplement, Issue 1, p187 

    The leather confections industry uses the silicone rubber moulds for the symbols, notices and models stamping on the footwear or morocco goods parts. The paper presents some contributions in this kind of devices manufacturing technology.

  • A parallel alignment device with dynamic force compensation for nanoimprint lithography. Weihai Chen; Chong Du; Yunjie Wu; Wenjie Chen; Mei Yuan // Review of Scientific Instruments;2014, Vol. 85 Issue 3, p1 

    Nanoimprint lithography is a nano/micro patterning technology to fabricate functional devices by pressing a template with predefined structures on a substrate. Uniformity of the force distribution between the contacting surfaces should be ensured to produce features with high fidelity. In this...

  • Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection. Cottat, Maximilien; Lidgi-Guigui, Nathalie; Tijunelyte, Inga; Barbillon, Grégory; Hamouda, Frédéric; Gogol, Philippe; Aassime, Abdelhanin; Lourtioz, Jean-Michel; Bartenlian, Bernard; de la Chapelle, Marc // Nanoscale Research Letters;Dec2014, Vol. 9 Issue 1, p1 

    We report on the use of soft UV nanoimprint lithography (UV-NIL) for the development of reproducible, millimeter-sized, and sensitive substrates for SERS detection. The used geometry for plasmonic nanostructures is the cylinder. Gold nanocylinders (GNCs) showed to be very sensitive and specific...

  • The underestimated impact of instabilities with nanoimprint. Mayer, A.; Dhima, K.; Wang, S.; Steinberg, C.; Papenheim, M.; Scheer, H.-C. // Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p405 

    With nanoimprint, instabilities of the polymeric layer between the substrate and the stamp are observed when incomplete filling of the stamp cavities prevails, resulting in capillary bridges and meandering structures. Experiments show that instabilities may also affect the initial situation of a...

  • Stretching-tunable metal gratings fabricated on an elastomeric substrate using a water-soluble sacrificial layer. Gu, Ronghua; Ji, Min; Xuan, Yan; Cui, Yushuang; Yuan, Changsheng; Li, Wen-Di; Ge, Haixiong; Chen, Yanfeng // Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p335 

    We report a new method to fabricate stretching-tunable metal gratings on elastomeric substrates by combining nanoimprint lithography and metal transfer using a patterned sacrificial layer. Fabrication of metal lines with a period of 550 nm and a linewidth of 270 nm was demonstrated on...

  • Sub-nanoscale nanoimprint fabrication of atomically stepped glassy substrates of silicate glass and acryl polymer. Yoshimoto, Mamoru // Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p321 

    In the nanoimprint process, the resolution limit of patterning has attracted much attention from both scientific and industrial aspects. In this article, we briefly review the main achievements of our research group on sub-nanoscale nanoimprint fabrication of atomically patterned glassy...

  • Near-zero-residual layer nanoimprint based on hybrid nanoimprint soft lithography. Cui, Yushuang; Lu, Jingjun; Fu, XinXin; Bian, Jie; Yuan, Changsheng; Ge, Haixiong; Chen, Yanfeng // Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p371 

    A thin and uniform residual layer, especially zero-residual layer, is highly desired in the nanoimprint lithography, because it is critical to the succeeding pattern transfer process. In this study, a partial cavity filling method was applied on UV-curable resins instead of thermal plastic...

  • Nanoimprint lithography of plasmonic platforms for SERS applications. Barcelo, Steven; Wu, Wei; Li, Xuema; Li, Zhiyong; Williams, R. // Applied Physics A: Materials Science & Processing;Nov2015, Vol. 121 Issue 2, p443 

    In this review, we describe the use of nanoimprint lithography in our group to fabricate plasmonic platforms with nanometer-scale critical features that would be significantly more expensive using other fabrication techniques: 3-D cones that have tips with a sub-10 nm radius of curvature, active...

Share

Read the Article

Courtesy of THE LIBRARY OF VIRGINIA

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics